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Beilstein J. Nanotechnol. 2020, 11, 1439–1449, doi:10.3762/bjnano.11.128
Figure 1: Fabricated noble metal particles. (a–e): SEM images of wafer surface; (f–j): particle size distribu...
Figure 2: SEM surface images after 90 cycles of Ir ALD. The inset shows the corresponding cross section.
Figure 3: Microscope image of etched structures.
Figure 4: SEM images of etched structures (with 50 mmol/L H2O2 and 1.73 mol/L HF for 10 min) using Au particl...
Figure 5: SEM images of etched structures (with 145 mmol/L H2O2 and 1.73 mol/L HF for 10 min) using Au partic...
Figure 6: Measured reflectance of Au wafers after 10 min of etching in HF (1.73 mol/L)/H2O2 solution.
Figure 7: SEM images of etched structures (with 50 mmol/L H2O2 and 1.73 mol/L HF for 10 min) using Pd particl...
Figure 8: SEM images of etched structures using Cu particles, etched for 10 min with 1.73 mol/L HF and 10 mmo...
Figure 9: SEM images of etched structures (with 100 mmol/L H2O2 and 1.73 mol/L HF for 10 min) using Ir partic...
Figure 10: Reflectance of fabricated 3D templates, etched with 50 mmol/L H2O2 and 1.73 mol/L HF for 10 min. Ad...